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An Introduction to
Ellipsometry
Course Objectives
• Understand the physical phenomena involved in
ellipsometry.
• Learn how the optical properties of materials and thin
films are related to the ellipsometric parameters.
• Learn how to analyze ellipsometric spectra to determine
material optical properties and film thickness.
• Learn how to relate optical constants to thin films
and bulk material microstructure
• Learn how to use ellipsometry for the study and control
of process kinetics.
• Learn the types of problems that can be solved with
ellipsometry
Course Description
This course is an introduction to reflection spectroscopic
ellipsometry that is a non-destructive and non-invasive optical
technique for material/thin film analysis. Single-wavelength
real time ellipsometry is also covered to introduce the attendant
to the monitoring and study of process kinetics. This course
emphasizes:
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• The principles of reflection elliposmetry
– polarized light, light reflection, the concept of
dielectric function, while including a minimum of mathematics.
• Qualitative analysis - identification of materials,
surface roughness effects, oxidation effects, density effects.
• Quantitative analysis – effective medium approximation
approaches to resolve microstructure, multi-layer systems,
and nanostructured systems, the ability to measure the thickness
of several layers simultaneously
• Applications
to solve surface-related problems.
• Applications
of real time ellipsometry to monitor, study and control
growth and processing of thin films
• The class
will discuss applications of the techniques in the areas
of material growth and processing, microelectronics, optoelectronics,
organic film, monolayers and others. |
Who Should Attend?
Scientists, engineers, technicians, and others entering the
field of the analysis of thin films and of the processing and
growth of material/thin films.
Course Materials:
Course Notes
Suggested textbook: H.G. Tompkins, “A User’s Guide
to Ellipsometry” Academic Press, Inc.
Instructor:
Maria Losurdo, Senior Scientist at IMIP-CNR, Bari, Italy
| Short Curriculum |
Dr. Maria Losurdo took the PhD in Material Science at Università di Bari, Italy. The research being performed by Dr. Maria Losurdo is directed in fundamental areas of plasmachemistry, as well as in applied areas of materials science. Thin-film preparation and the optical properties of solids are the two dominant themes in much of this research.
The fundamental research component involves understanding the interaction of plasmas with surfaces and optical properties of ultrathin films and clusters. It also involves characterizing and understanding the chemical processes that occur during thin-film nucleation and growth, as well as during treatments for surface modifications (cleaning, passivation, oxidation, nitridation,….). Reference materials are silicon and III-V semiconductors, metal oxides, high-K dielectrics, polymers.
The applied component of Dr. Losurdo's research involves studying the ability to control the nucleation and growth processes through certain experimentally controllable features (i.e., the chemical species that are the building blocks of the film, as well as the energy with which these species impact the substrate/film). The choice of complex technologically relevant systems in addition to model systems contributes to the challenge of the research. Much of Dr Losurdo's research involves the use of a monolayer-sensitive optical probe called spectroscopic ellipsometry that can be used in situ and in real time during the formation of clusters and thin films. Another critical component of Dr. Losurdo's research involves the modeling of optical properties of materials to stay in the forefront of research in the area of optical properties of solids and development of surface treatment/growth processes.
On the above topics, Dr. Losurdo has about 100 original publications in JCR journals and over 100 presentations at International Conferences. |
Questions?: cscpml18@area.ba.cnr.it
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